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STOCHASTIC PROCESS VARIATION IN DEEP-SUBMICRON CMOS IBD

SPRINGER
08 / 2016
9789402402858
Inglés

Sinopsis

1 Introduction. 1.1 Stochastic Process Variations in Deep-Submicron CMOS. 1.2 Remarks on Current Design Practice. 1.3Motivation. 1.4 Organization of the Book.2. Random Process Variation in Deep-Submicron CMOS. 2.1 Modeling Process Variability. 2.2 Stochastic MNA for Process Variability Analysis. 2.3 Statistical Timing Analysis. 2.4 Yield Constrained Energy Optimization. 2.5 Experimental Results. 2.6 Conclusions.3 Electronic Noise in Deep-Submicron CMOS. 3.1 Stochastic MNA for Noise Analysis. 3.2 Accuracy Considerations. 3.3 Adaptive Numerical Integration Methods. 3.4 Estimation of the Noise Content Contribution. 3.5 Experimental Results. 3.6 Conclusions.4 Thermal Effects in Deep-Submicron CMOS.4.1 Thermal Model. 4.2 Temperature Estimation. 4.3 Reducing Computation Complexity. 4.4 System Level Methodology for Temperature Constrained Power Management. 4.5 Experimental Results. 4.6 Conclusions.5 Circuit Solutions.5.1 Architecture of the System. 5.2 Circuits for Active Monitoring of Temperature and Process Variations. 5.3 Characterization of Process Variability Conditions. 5.4 Experimental Results. 5.5 Conclusions. 6 Conclusions and Recommendations. 6.1 Summary of the Results. 6.2 Recommendations and Future Research. Appendix. References. Acknowledgement. About the Author.

PVP
134,28